An ice lithography instrument
نویسندگان
چکیده
منابع مشابه
An ice lithography instrument.
We describe the design of an instrument that can fully implement a new nanopatterning method called ice lithography, where ice is used as the resist. Water vapor is introduced into a scanning electron microscope (SEM) vacuum chamber above a sample cooled down to 110 K. The vapor condenses, covering the sample with an amorphous layer of ice. To form a lift-off mask, ice is removed by the SEM ele...
متن کاملIce lithography for nanodevices.
We report the successful application of a new approach, ice lithography (IL), to fabricate nanoscale devices. The entire IL process takes place inside a modified scanning electron microscope (SEM), where a vapor-deposited film of water ice serves as a resist for e-beam lithography, greatly simplifying and streamlining device fabrication. We show that labile nanostructures such as carbon nanotub...
متن کاملIce-assisted electron beam lithography of graphene.
We demonstrate that a low energy focused electron beam can locally pattern graphene coated with a thin ice layer. The irradiated ice plays a crucial role in the process by providing activated species that locally remove graphene from a silicon dioxide substrate. After patterning the graphene, the ice resist is easily removed by sublimation to leave behind a clean surface with no further process...
متن کاملHandwriting Difficulties: Introducing an Instrument
Objectives: The main purpose of this study is to produce an instrument for handwriting evaluation and to execute it on mentally retarded (MR) students. Methods: This was a descriptive, cross-sectional, and relationship study. 126 MR students (53 girls and 73 boys) ranging from 9 to 19 years old (13.23±2.17) from two exceptional children schools in shahr-e-rey participated in this study. A ha...
متن کاملAn Introduction to Lithography
VLSI devices consist of highly complicated and dense circuit patterns. Lithography is the process by which the circuit patterns are transferred on to the semiconductor wafer, and current techniques can offer resolutions of around 100nm. However, as demand increases for smaller devices, the resolution offered by current techniques will not be satisfactory. We will look at current techniques, the...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Review of Scientific Instruments
سال: 2011
ISSN: 0034-6748,1089-7623
DOI: 10.1063/1.3601005